CVD缺陷生长二维层

简要描述：Newly acquired ion implantation accelerator unit allows 2Dsemiconductors USA to create desired amounts of defects by alpha particle irradiation process at select amount of doses.

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更新时间：2026-04-09
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二维材料

其他二维材料二维材料粉末二维材料溶液碲化物晶体硒化物晶体硫化物晶体绝缘体钙钛矿异质结 MOFS材料二维材料薄膜黑磷六方氮化硼查看全部产品

Newly acquired ion implantation accelerator unit allows 2Dsemiconductors USA to create desired amounts of defects by alpha particle irradiation process at select amount of doses. Please contact us for details and pricing.